WILLOUGHBY, OHIO – The new XC High-Flow Inline Heat Exchanger from Process Technology delivers an ultra-high-purity (UHP), compact, high-flow heat exchanger with precise and stable heat transfer while reducing fluid pressure drop.
High-flow capacity is achieved with a larger 13mm (0.5 inch) diameter tubing to improve circulation, reduce pressure drop, and enable a faster temperature response. The low-mass unit is internally baffled for additional heat performance. Recirculating and single-pass flow applications provide safe heating for water, acids, bases, and solvents.
Clean-room assembled, no wetted o-ring, PFA tube-side chemistry paths allow the XC High-Flow to meet the most stringent cleanliness requirements to support next-generation ultra-high-purity semiconductor node technologies.
The units' small, lightweight footprint reduces space requirements in tool design and allows for easy adaptations to existing lines for simplified end-user manufacturing complexity.
On behalf of Process Technology, Senior Product Manager, Doreen Langa stated, “Process Technology continues to be responsive to the ever-changing technological needs of our customers in the semiconductor, electronics and pharmaceutical industries. We work hand-in-hand with our customers to design solutions that improve efficiencies. The XC High-Flow Inline Heat Exchanger, with its fast temperature responsiveness, is one such advancement that achieves the high flow requirements with reduced pressure drop.”
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